San Jose, California
United States
12
2013-05-02
The entities that hold a legal rights for patent applications filed by inventor Eib Nicholas K.:
Nicholas K. Eib from San Jose, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Maskless vortex phase shift optical direct write lithography
#2 | 2012-02-16Maskless vortex phase shift optical direct write lithography
#3 | 2011-09-06Method for providing temperature uniformity of rapid thermal annealing
#4 | 2007-10-25Optimized mirror design for optical direct write
#5 | 2006-09-14Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping
#6 | 2005-12-15Maskless vortex phase shift optical direct write lithography
#7 | 2005-10-27Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography
#8 | 2005-09-08OPC based illumination optimization with mask error constraints
#9 | 2005-07-14Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
#10 | 2005-07-14Process and apparatus for applying apodization to maskless optical direct write lithography processes
#11 | 2005-04-28Optimized mirror design for optical direct write
#12 | 2005-01-20Phase edge darkening binary masks
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