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Inventor profile of:

Eugene Shifrin

City:

Sunnyvale, California

Country:

United States

Published Applications:

30

Last publication date:

2024-05-16

Top Assignees for applications by Eugene Shifrin

The entities that hold a legal rights for patent applications filed by inventor Shifrin Eugene:

KLA-Tencor Corporation 16 Milpitas, CA United States
KLA-Tencor Corp. 7 Milpitas, CA United States
KLA Corporation 3 Milpitas, CA United States
KLA-TENCOR TECHNOLOGIES CORP. 2 Milpitas, CA United States
KLA-TENCOR TECHNOLOGIES CORPORATION 1 Milpitas, CA United States
KLA Corp. 1 Milpitas, CA United States

Recent patent applications by Shifrin Eugene

Eugene Shifrin from Sunnyvale, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2024-05-16

US20240161272A1

MULTIMODE DEFECT DETECTION

#2 | 2021-11-04

US20210342992A1

Print check repeater defect detection

#3 | 2021-07-29

US20210231292A1

Mechanical engineering

Plasma Cell for Providing VUV Filtering in a Laser-Sustained Plasma Light Source

#4 | 2021-01-21

US20210022233A1

High efficiency laser-sustained plasma light source with collection of broadband radiation

#5 | 2020-08-13

US20200258792A1

System, method and non-transitory computer readable medium for tuning sensitivities of, and determining a process window for, a modulated wafer

#6 | 2020-07-30

US20200240928A1

Repeater defect detection

#7 | 2020-06-25

US20200202504A1

Differential imaging for single-path optical wafer inspection

#8 | 2019-12-12

US20190378684A1

Neutral atom imaging system

#9 | 2019-09-19

US20190287785A1

System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination

#10 | 2019-04-18

US20190115203A1

Continuous-wave laser-sustained plasma illumination source

#11 | 2018-12-06

US20180348147A1

Repeater defect detection

#12 | 2018-06-21

US20180172240A1

Mechanical engineering

Plasma cell for providing VUV filtering in a laser-sustained plasma light source

#13 | 2018-05-24

US20180144996A1

System, method and non-transitory computer readable medium for tuning sensitivies of, and determining a process window for, a modulated wafer

#14 | 2018-05-10

US20180130199A1

High sensitivity repeater defect detection

#15 | 2017-11-02

US20170315369A1

System and method for separation of pump light and collected light in a laser pumped light source

#16 | 2016-12-29

US20160381776A1

High efficiency laser-sustained plasma light source

#17 | 2016-09-15

US20160268120A1

Continuous-wave laser-sustained plasma illumination source

#18 | 2016-05-19

US20160140412A1

System and method for enhanced defect detection with a digital matched filter

#19 | 2016-04-14

US20160104600A1

Defect detection using structural information

#20 | 2016-03-03

US20160061749A1

Array mode repeater detection

#21 | 2016-03-03

US20160061745A1

Repeater detection

#22 | 2015-11-12

US20150324964A1

Inspection recipe setup from reference image variation

#23 | 2015-02-19

US20150049778A1

System and method for separation of pump light and collected light in a laser pumped light source

#24 | 2015-01-08

US20150012900A1

Detecting defects on a wafer

#25 | 2014-12-25

US20140376802A1

Wafer inspection using free-form care areas

#26 | 2014-02-20

US20140050389A1

Automated inspection scenario generation

#27 | 2013-07-18

US20130181595A1

Mechanical engineering

Plasma cell for providing VUV filtering in a laser-sustained plasma light source

#28 | 2011-12-01

US20110291566A1

Multi-wavelength pumping to sustain hot plasma

#29 | 2011-06-16

US20110142327A1

Methods for accurate identification of an edge of a care area for an array area formed on a wafer and methods for binning defects detected in an array area formed on a wafer

#30 | 2008-08-28

US20080205745A1

Methods for accurate identification of an edge of a care area for an array area formed on a wafer and methods for binning defects detected in an array area formed on a wafer

InventorID:

341405 ⎘