NOVA MEASURING INSTRUMENTS LTD.

Accurate Raman spectroscopy

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Raman spectroscopy based measurement system

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Integrated measurement system

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OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM

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Scatterometry system and method

#6 | 2021-07-22 ✅ Patent 11,415,519 granted on 2022-08-16

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Accurate Raman spectroscopy

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System and method for measuring a sample by x-ray reflectance scatterometry

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Metrology and process control for semiconductor manufacturing

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Method and system for optical characterization of patterned samples

#10 | 2020-06-18 ✅ Patent 10,664,638 granted on 2020-05-26

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Measuring complex structures in semiconductor fabrication

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Optical phase measurement system and method

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Scatterometry system and method

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TEM-based metrology method and system

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Method and system for optical metrology in patterned structures

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Scatterometry system and method

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Optical phase measurement method and system

#17 | 2019-05-02 ✅ Patent 10,739,277 granted on 2020-08-11

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Optical system and method for measurements of samples

#18 | 2019-02-28 ✅ Patent 10,365,163 granted on 2019-07-30

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Optical critical dimension metrology

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X-ray based measurements in patterned structure

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Method and system for processing patterned structures

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Raman spectroscopy based measurements in patterned structures

#22 | 2018-11-15 ✅ Patent 10,876,959 granted on 2020-12-29

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Method and system for optical characterization of patterned samples

#23 | 2018-07-12 ✅ Patent 10,534,275 granted on 2020-01-14

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Method for use in process control of manufacture of patterned sample

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Optical metrology for in-situ measurements

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Optical phase measurement method and system

#26 | 2018-02-22 ✅ Patent 10,274,435 granted on 2019-04-30

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Method and system for optical metrology in patterned structures

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Surface planarization system and method

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Test structure for use in metrology measurements of patterns

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Metrology test structure design and measurement scheme for measuring in patterned structures

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Process control using non-zero order diffraction

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Optical metrology for in-situ measurements

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TEST STRUCTURE DESIGN FOR METROLOGY MEASUREMENTS IN PATTERNED SAMPLES

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Optical method and system for defects detection in three-dimensional structures

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Method and system for improving optical measurements on small targets

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Overlay design optimization

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Measurement system and method for measuring in thin films

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Test structures and metrology technique utilizing the test structures for measuring in patterned structures

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Optical phase measurement method and system

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Method and system for planning metrology measurements

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Optical critical dimension metrology

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Lateral shift measurement using an optical technique

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Surface planarization system and method

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Mechanical engineering

Assembly for producing a plurality of beam bundles

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Method and system for optimizing optical inspection of patterned structures

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Method and system for determining strain distribution in a sample

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Method and system for improving optical measurements on small targets

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Scatterometry method and system

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Optical phase measurement method and system

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Optical method and system for critical dimensions and thickness characterization

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Optical metrology for in-situ measurements

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Optical method and system for measuring isolated features of a structure

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Optical method and system for detecting defects in three-dimensional structures

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Lateral shift measurement using an optical technique

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Method and system for measuring patterned structures

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Optical system and method for measurement of one or more parameters of via-holes

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Monitoring apparatus and method particularly useful in photolithographically processing substrates

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Monitoring system and method for verifying measurements in patterned structures

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Optical system and method for measuring in patterned structures

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Method and system for use in monitoring properties of patterned structures

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METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES

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Process control using non-zero order diffraction

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METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES

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Optical system and method for measuring in three-dimensional structures

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METHOD AND SYSTEM FOR USE IN MEASURING IN COMPLEX PATTERNED STRUCTURES

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METHOD AND SYSTEM FOR OPTIMIZING OPTICAL INSPECTION OF PATTERNED STRUCTURES

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Lateral shift measurement using an optical technique

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METHOD AND SYSTEM FOR MEASURING IN PATTERNED STRUCTURES

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Method and system for use in monitoring properties of patterned structures

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Method and system for endpoint detection

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Thin films measurement method and system

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Method and system for measuring patterned structures

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Method and system for endpoint detection

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Line edge roughness measuring technique and test structure

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Monitoring apparatus and method particularly useful in photolithographically processing substrates

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Method and system for measuring patterned structures

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METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES

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Lateral shift measurement using an optical technique

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Method and system for use in monitoring properties of patterned structures

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Method and system for measuring patterned structures

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Method and system for measuring in patterned structures

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Method and system for endpoint detection

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Thin films measurement method and system

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Monitoring apparatus and method particularly useful in photolithographically processing substrates

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REFLECTIVE OPTICAL SYSTEM

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Method and system for measuring patterned structures

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Spectrometric optical method and system providing required signal-to-noise of measurements

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Vacuum UV based optical measuring method and system

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Method and system for measuring patterned structures

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APPARATUS FOR OPTICAL INSPECTION OF WAFERS DURING POLISHING

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Thin films measurement method and system

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OPTICAL MEASUREMENTS OF PATTERNED ARTICLES

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Lateral shift measurement using an optical technique

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Method and system for measuring patterned structures

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METHOD AND SYSTEM FOR MEASURING PATTERNED STRUCTURES

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Method and system for measuring patterned structures

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Method and system for measuring patterned structures

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