Bend, Oregon
United States
21
2008-01-17
14
2010-09-21
These are the the leading inventors for applications assigned to ACCENT OPTICAL TECHNOLOGIES, INC.:
ACCENT OPTICAL TECHNOLOGIES, INC. based in Bend, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method for designing gratings
#2 | 2007-08-30 ✅ Patent 7,515,279 granted on 2009-04-07Line profile asymmetry measurement
#3 | 2007-08-16 ✅ Patent 7,619,753 granted on 2009-11-17Method for measuring dimensions and optical system using the same
#4 | 2007-08-02Apparatuses and methods for analyzing semiconductor workpieces
#5 | 2007-07-05 ✅ Patent 7,355,713 granted on 2008-04-08Method for inspecting a grating biochip
#6 | 2007-03-15 ✅ Patent 7,474,401 granted on 2009-01-06Multi-layer alignment and overlay target and measurement method
#7 | 2007-01-18 ✅ Patent 7,433,060 granted on 2008-10-07Method for correlating a structural parameter of a plurality of gratings and method for determining a structural parameter value of an unknown grating using the same
#8 | 2007-01-04Apparatuses and methods for detecting defects in semiconductor workpieces
#9 | 2006-12-28Apparatus and method for enhanced critical dimension scatterometry
#10 | 2006-12-28 ✅ Patent 7,502,101 granted on 2009-03-10Apparatus and method for enhanced critical dimension scatterometry
#11 | 2006-12-28Apparatus and method for enhanced critical dimension scatterometry
#12 | 2006-12-21Apparatuses and methods for enhanced critical dimension scatterometry
#13 | 2006-12-21Apparatus and method for enhanced critical dimension scatterometry
#14 | 2006-12-14 ✅ Patent 7,511,293 granted on 2009-03-31Scatterometer having a computer system that reads data from selected pixels of the sensor array
#15 | 2006-12-07Apparatus and method for enhanced critical dimension scatterometry
#16 | 2006-11-02 ✅ Patent 7,615,752 granted on 2009-11-10Apparatus and method for enhanced critical dimension scatterometry
#17 | 2006-10-10 ✅ Patent 7,119,893 granted on 2006-10-10Determination of center of focus by parameter variability analysis
#18 | 2006-09-19 ✅ Patent 7,110,099 granted on 2006-09-19Determination of center of focus by cross-section analysis
#19 | 2006-08-31 ✅ Patent 7,265,571 granted on 2007-09-04Method and device for determining a characteristic of a semiconductor sample
#20 | 2006-05-30 ✅ Patent 7,053,991 granted on 2006-05-30Differential numerical aperture methods
#21 | 2005-02-15 ✅ Patent 6,856,408 granted on 2005-02-15Line profile asymmetry measurement using scatterometry
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