Milpitas, California
United States
113
2019-06-06
105
2019-10-22
These are the the leading inventors for applications assigned to Nanometrics Incorporated:
Nanometrics Incorporated based in Milpitas, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Local purge within metrology and inspection systems
#2 | 2018-12-06 ✅ Patent 10,274,367 granted on 2019-04-30Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device
#3 | 2018-06-07 ✅ Patent 10,288,408 granted on 2019-05-14Scanning white-light interferometry system for characterization of patterned semiconductor features
#4 | 2017-02-02 ✅ Patent 10,061,210 granted on 2018-08-283D target for monitoring multiple patterning process
#5 | 2017-01-26 ✅ Patent 9,824,176 granted on 2017-11-21Optical critical dimension target design
#6 | 2017-01-19 ✅ Patent 10,488,184 granted on 2019-11-26Interferometric characterization of surface topography
#7 | 2016-11-24 ✅ Patent 9,995,689 granted on 2018-06-12Optical metrology using differential fitting
#8 | 2016-10-06 ✅ Patent 9,846,122 granted on 2017-12-19Optical metrology system for spectral imaging of a sample
#9 | 2016-04-07 ✅ Patent 9,958,327 granted on 2018-05-01Deconvolution to reduce the effective spot size of a spectroscopic optical metrology device
#10 | 2016-02-04 ✅ Patent 9,958,673 granted on 2018-05-01Protected lens cover plate for an optical metrology device
#11 | 2016-02-04 ✅ Patent 10,082,461 granted on 2018-09-25Optical metrology with purged reference chip
#12 | 2015-10-29 ✅ Patent 9,547,244 granted on 2017-01-17Simultaneous measurement of multiple overlay errors using diffraction based overlay
#13 | 2015-06-18 ✅ Patent 9,903,806 granted on 2018-02-27Focusing system with filter for open or closed loop control
#14 | 2015-06-18 ✅ Patent 10,254,110 granted on 2019-04-09Via characterization for BCD and depth metrology
#15 | 2015-06-04 ✅ Patent 9,115,987 granted on 2015-08-25Optical metrology with multiple angles of incidence and/or azimuth angles
#16 | 2015-05-28 ✅ Patent 9,182,351 granted on 2015-11-10Optical metrology system for spectral imaging of a sample
#17 | 2014-09-04 ✅ Patent 10,296,554 granted on 2019-05-21Correction of angular error of plane-of-incidence azimuth of optical metrology device
#18 | 2014-09-02 ✅ Patent 8,825,444 granted on 2014-09-02Automated system check for metrology unit
#19 | 2014-04-10 ✅ Patent 9,243,999 granted on 2016-01-26Ellipsometer focusing system
#20 | 2013-10-24 ✅ Patent 8,817,273 granted on 2014-08-26Dark field diffraction based overlay
#21 | 2013-10-03PLASMA LAMP IGNITION SOURCE
#22 | 2013-09-19DUAL ANGLES OF INCIDENCE AND AZIMUTH ANGLES OPTICAL METROLOGY
#23 | 2013-08-15 ✅ Patent 10,107,621 granted on 2018-10-23Image based overlay measurement with finite gratings
#24 | 2013-08-06 ✅ Patent 8,501,501 granted on 2013-08-06Measurement of a sample using multiple models
#25 | 2012-11-01 ✅ Patent 9,110,127 granted on 2015-08-18Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
#26 | 2012-10-25 ✅ Patent 8,818,754 granted on 2014-08-26Thin films and surface topography measurement using reduced library
#27 | 2012-10-11 ✅ Patent 8,559,008 granted on 2013-10-15Ellipsometer focusing system
#28 | 2012-09-06Parallel Acquisition Of Spectra For Diffraction Based Overlay
#29 | 2012-09-04 ✅ Patent 8,259,297 granted on 2012-09-04Scanning focal length metrology
#30 | 2012-09-04 ✅ Patent 8,259,296 granted on 2012-09-04Scanning focal length metrology
#31 | 2012-08-28 ✅ Patent 8,252,608 granted on 2012-08-28Measurement of a sample using multiple models
#32 | 2012-07-12 ✅ Patent 8,427,645 granted on 2013-04-23Mueller matrix spectroscopy using chiroptic
#33 | 2012-06-28 ✅ Patent 9,007,584 granted on 2015-04-14Simultaneous measurement of multiple overlay errors using diffraction based overlay
#34 | 2012-02-16 ✅ Patent 8,462,345 granted on 2013-06-11In-plane optical metrology
#35 | 2011-11-22 ✅ Patent 8,062,910 granted on 2011-11-22Measurement of a sample using multiple models
#36 | 2011-11-03 ✅ Patent 8,534,135 granted on 2013-09-17Local stress measurement
#37 | 2011-09-29 ✅ Patent 9,239,523 granted on 2016-01-19Diffraction based overlay linearity testing
#38 | 2011-06-16 ✅ Patent 8,330,946 granted on 2012-12-11Silicon filter for photoluminescence metrology
#39 | 2011-04-28 ✅ Patent 8,379,227 granted on 2013-02-19Optical metrology on textured samples
#40 | 2011-04-07 ✅ Patent 8,525,993 granted on 2013-09-03Scatterometry measurement of asymmetric structures
#41 | 2011-03-24 ✅ Patent 8,339,605 granted on 2012-12-25Multilayer alignment and overlay target and measurement method
#42 | 2011-03-10 ✅ Patent 8,107,079 granted on 2012-01-31Multi layer alignment and overlay target and measurement method
#43 | 2010-10-28 ✅ Patent 8,170,838 granted on 2012-05-01Simulating two-dimensional periodic patterns using compressed fourier space
#44 | 2010-06-24 ✅ Patent 8,232,817 granted on 2012-07-31Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
#45 | 2010-06-03 ✅ Patent 8,027,037 granted on 2011-09-27Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
#46 | 2010-04-13 ✅ Patent 7,697,135 granted on 2010-04-13Scanning focal length metrology
#47 | 2009-12-03Imaging Diffraction Based Overlay
#48 | 2009-11-05 ✅ Patent 8,126,694 granted on 2012-02-28Modeling conductive patterns using an effective model
#49 | 2009-09-17 ✅ Patent 7,842,179 granted on 2010-11-30Sealing ring assembly and mounting method
#50 | 2009-07-30 ✅ Patent 7,639,371 granted on 2009-12-29Line profile asymmetry measurement
#51 | 2009-06-11Support Pin with Dome Shaped Upper Surface
#52 | 2009-05-07 ✅ Patent 7,808,643 granted on 2010-10-05Determining overlay error using an in-chip overlay target
#53 | 2009-02-17 ✅ Patent 7,492,467 granted on 2009-02-17Method and apparatus for measuring thickness and optical properties of a thin-film on a substrate
#54 | 2009-02-12 ✅ Patent 8,068,228 granted on 2011-11-29In-plane optical metrology
#55 | 2009-01-08 ✅ Patent 8,045,790 granted on 2011-10-25Method for automatically de-skewing of multiple layer wafer for improved pattern recognition
#56 | 2009-01-06 ✅ Patent 7,473,502 granted on 2009-01-06Imaging tool calibration artifact and method
#57 | 2008-12-16 ✅ Patent 7,465,590 granted on 2008-12-16Measurement of a sample using multiple models
#58 | 2008-11-11 ✅ Patent 7,450,225 granted on 2008-11-11Correction of optical metrology for focus offset
#59 | 2008-11-04 ✅ Patent 7,446,868 granted on 2008-11-04Micro defects in semi-conductors
#60 | 2008-10-07 ✅ Patent 7,433,034 granted on 2008-10-07Darkfield defect inspection with spectral contents
#61 | 2008-10-07 ✅ Patent 7,433,509 granted on 2008-10-07Method for automatic de-skewing of multiple layer wafer for improved pattern recognition
#62 | 2008-09-11 ✅ Patent 7,847,939 granted on 2010-12-07Overlay measurement target
#63 | 2008-05-13 ✅ Patent 7,372,565 granted on 2008-05-13Spectrometer measurement of diffracting structures
#64 | 2008-04-22 ✅ Patent 7,362,448 granted on 2008-04-22Characterizing residue on a sample
#65 | 2008-03-27Generation of Monochromatic and Collimated X-Ray Beams
#66 | 2008-01-24Methods and apparatuses for assessing overlay error on workpieces
#67 | 2008-01-24 ✅ Patent 7,751,061 granted on 2010-07-06Non-contact apparatus and method for measuring a property of a dielectric layer on a wafer
#68 | 2007-12-27 ✅ Patent 7,469,164 granted on 2008-12-23Method and apparatus for process control with in-die metrology
#69 | 2007-11-29 ✅ Patent 7,663,385 granted on 2010-02-16Apparatus and method for electrical characterization by selecting and adjusting the light for a target depth of a semiconductor
#70 | 2007-11-27 ✅ Patent 7,301,623 granted on 2007-11-27Transferring, buffering and measuring a substrate in a metrology system
#71 | 2007-11-13 ✅ Patent 7,295,314 granted on 2007-11-13Metrology/inspection positioning system
#72 | 2007-09-27 ✅ Patent 7,289,215 granted on 2007-10-30Image control in a metrology/inspection positioning system
#73 | 2007-09-13 ✅ Patent 7,656,542 granted on 2010-02-02Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
#74 | 2007-08-30 ✅ Patent 7,515,279 granted on 2009-04-07Line profile asymmetry measurement
#75 | 2007-06-26 ✅ Patent 7,236,244 granted on 2007-06-26Alignment target to be measured with multiple polarization states
#76 | 2007-06-12 ✅ Patent 7,230,705 granted on 2007-06-12Alignment target with designed in offset
#77 | 2007-04-12 ✅ Patent 7,804,641 granted on 2010-09-28Focusing system and method
#78 | 2007-04-10 ✅ Patent 7,202,958 granted on 2007-04-10Modeling a sample with an underlying complicated structure
#79 | 2007-03-01 ✅ Patent 7,410,815 granted on 2008-08-12Apparatus and method for non-contact assessment of a constituent in semiconductor substrates
#80 | 2007-02-06 ✅ Patent 7,173,417 granted on 2007-02-06Eddy current sensor with concentric confocal distance sensor
#81 | 2007-01-11 ✅ Patent 7,504,642 granted on 2009-03-17Photoluminescence imaging with preferential detection of photoluminescence signals emitted from a specified material layer of a wafer or other workpiece
#82 | 2007-01-11 ✅ Patent 7,446,321 granted on 2008-11-04Differential wavelength photoluminescence for non-contact measuring of contaminants and defects located below the surface of a wafer or other workpiece
#83 | 2006-12-28 ✅ Patent 7,502,101 granted on 2009-03-10Apparatus and method for enhanced critical dimension scatterometry
#84 | 2006-12-14 ✅ Patent 7,511,293 granted on 2009-03-31Scatterometer having a computer system that reads data from selected pixels of the sensor array
#85 | 2006-11-23 ✅ Patent 7,589,834 granted on 2009-09-15Detection method and apparatus metal particulates on semiconductors
#86 | 2006-11-02 ✅ Patent 7,615,752 granted on 2009-11-10Apparatus and method for enhanced critical dimension scatterometry
#87 | 2006-10-03 ✅ Patent 7,115,858 granted on 2006-10-03Apparatus and method for the measurement of diffracting structures
#88 | 2006-09-21 ✅ Patent 7,713,404 granted on 2010-05-11Monitoring apparatus and method for improving the accuracy and repeatability of electrochemical capacitance voltage (ECV) measurements
#89 | 2006-09-07 ✅ Patent 7,477,396 granted on 2009-01-13Methods and systems for determining overlay error based on target image symmetry
#90 | 2006-07-13 ✅ Patent 7,379,184 granted on 2008-05-27Overlay measurement target
#91 | 2006-07-06 ✅ Patent 7,532,317 granted on 2009-05-12Scatterometry method with characteristic signatures matching
#92 | 2006-06-20 ✅ Patent 7,064,828 granted on 2006-06-20Pulsed spectroscopy with spatially variable polarization modulation element
#93 | 2006-06-13 ✅ Patent 7,061,613 granted on 2006-06-13Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
#94 | 2006-06-13 ✅ Patent 7,061,615 granted on 2006-06-13Spectroscopically measured overlay target
#95 | 2006-05-16 ✅ Patent 7,046,361 granted on 2006-05-16Positioning two elements using an alignment target with a designed offset
#96 | 2006-04-25 ✅ Patent 7,032,287 granted on 2006-04-25Edge grip chuck
#97 | 2006-04-11 ✅ Patent 7,027,640 granted on 2006-04-11Method and apparatus for inspecting defects on polishing pads to be used with chemical mechanical polishing apparatus
#98 | 2006-02-28 ✅ Patent 7,005,306 granted on 2006-02-28Accurate thickness measurement of thin conductive film
#99 | 2006-01-31 ✅ Patent 6,992,764 granted on 2006-01-31Measuring an alignment target with a single polarization state
#100 | 2006-01-03 ✅ Patent 6,982,793 granted on 2006-01-03Method and apparatus for using an alignment target with designed in offset
Also check out Nanometrics Incorporated's (Milpitas, United States) applicant profile with 20 patent applications submitted.
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